CBG Studio | REMIX [Brutalist Mesh x Sub-Atomic Bloom]: seamless textile pattern, repeatable surface design, flat layout, architectural motif, brutalist architectural lines, industrial mesh textures, safety-hazard stenciling, raw concrete substrate, high-contrast structural grid, weathered industrial markings., subtle interference: sub-atomic particle decay, bioluminescent organic structures, quantum lattice overlay, fractal botanical motifs, microscopic spore patterns, industrial noir color palette, phosphor green accents, sharp details, high contrast., sharp, clean limb definition, standard anatomical placement, avoid: complex integrated layering
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1 lab note
More of this garment with different prints